Abstract:

The present invention provides an electrochem. method for depositing a thin film comprising metal oxides or silicon oxides on a conductive surface placed on a non-conductive substrate by electrodeposition of sol-gel precursors on the conductive surface selectively. The sol-gel precursors may further comprise various dopants thereby patterning the conductive layer. [on SciFinder(R)]

Notes:

CAPLUS AN 2005:1154742(Patent)