Electrodeposition of methylated sol-gel films on conducting surfaces.

Citation:

Shacham R, Avnir D, Mandler D. Electrodeposition of methylated sol-gel films on conducting surfaces. Adv. Mater. (Weinheim, Ger.)Advanced Materials (Weinheim, Germany). 1999;11 (5) :384 - 388.

Date Published:

1999///

Abstract:

An approach to sol-gel film formation is described, involving electrochem. control of pH near a conductive surface, in which methyltrimethoxysilane (MeTMOS) is deposited onto indium tin oxide (ITO) and Au surfaces. The method is based on a 2-step sol-gel prepn. procedure in which MeTMOS is first pre-hydrolyzed and then polycondensed. A const. neg. potential is applied to the electrode surface, increasing the concn. of hydroxyl ions, which act as a catalyst in the condensation process. This results in greater control over the deposition process and thus over film properties. [on SciFinder(R)]

Notes:

CAPLUS AN 1999:277831(Journal)