Improved resolution of local metal deposition by means of constant distance mode scanning electrochemical microscopy.

Citation:

Turyan I, Etienne M, Mandler D, Schuhmann W. Improved resolution of local metal deposition by means of constant distance mode scanning electrochemical microscopy. ElectroanalysisElectroanalysis. 2005;17 (5-6) :538 - 542.

Date Published:

2005///

Abstract:

The potential assisted ion-transfer between two immiscible electrolyte solns. has been implemented in scanning electrochem. microscopy (SECM) for depositing metal microstructures on conducting surfaces. An improved approach for local metal deposition is presented, taking advantage from a recently described non-optical shear-force detection system integrated in the SECM, which provided a current-independent tip-surface distance positioning. This allowed positioning of the micropipette in very close proximity to the surface without applying a potential during the approach, and hence, resulted in an improved resoln. for metal deposition. Moreover, it allowed the use of potential pulses for a discontinuous delivery of metal ions over the liq.-liq. interface. The advantages of this approach and its applicability for creating micro- and nanostructures are discussed. [on SciFinder(R)]

Notes:

CAPLUS AN 2005:312074(Journal)