%0 Journal Article %J JOURNAL OF MICROELECTROMECHANICAL SYSTEMS %D 2003 %T

Monolithic Fringe-Field-Activated Crystalline SiliconTilting-Mirror Devices

%A Dennis S. Greywall %A Chien-Shing Pai %A Sang-Hyun Oh %A Chorng-Ping Chang %A Dan M. Marom %A Paul A. Busch %A Raymond A. Cirelli %A J. Ashley Taylor %A Fred P. Klemens %A Thomas W. Sorsch %A John Eric Bower %A Warren Y.-C. Lai %A Hyongsok T. Soh %X

A new approach is presented for fabricating monolithic crystalline silicon tilting-mirror microoptoelectromechanical systems (MOEMS) devices. The activation electrodes, etched from a thick silicon layer deposited over insulating oxide onto the top surface of a silicon-on-insulator (SOI) wafer, are displaced from the mirrors and interact with these tilting elements via electrostatic fringing fields. In contrast to the more usual parallel-plate activation, the rotation angle saturates at high voltages. This paper discusses concept, design, and processing, and also compares modeling and measured performance of a specific 9 tilt range device array.

%B JOURNAL OF MICROELECTROMECHANICAL SYSTEMS %V 12 %P 702-707 %G eng %U http://ieeexplore.ieee.org/xpl/articleDetails.jsp?arnumber=1240141 %N 5