Abstract:

It is shown that the implantation of protons in electrooptical substrates enables the construction of 3D structures with submicron features that are both conductive and photoconductive embedded in amorphized regions that possess reduced refractive index. The conductivity and photoconductivity are attributed to the transformation of the material into a degenerate semiconductor due to the formation of high concentration of OH.sup.- complexes that are created by the bonding of the implanted H.sup.+ ions to the O.sup.-2 ions of the lattice. It is argued that these results extend significantly the capabilities of integrated photonic circuits and devices fabricated by Refractive Index Engineering by ion implantations.

Notes:

Item Citation: Applied Physics A: Materials Science & Processing. Jan 2011, Vol. 102 Issue 1, p45, 4 p.Accession Number: edsgcl.246178061; Publication Type: Academic Journal; Source: Applied Physics A: Materials Science & Processing; Language: English; Publication Date: 20110101; Rights: Copyright 2011 Gale, Cengage Learning. All rights reserved., COPYRIGHT 2011 Springer; Imprint: Springer